Deutsch Intern
    Wilhelm Conrad Röntgen Research Center for Complex Material Systems

    Zeiss He/Ne/Ga scanning ion microscope (Orion nanoFab)

    Specifications

    • Ion Beams: Ga, Ne, He
    • Gas field ion source
    • advanced nanopatterning and visulaization engine (NPVE)
    • electron flood gun for charge compensation
    • Resolution: 0.5 nm (10 - 35 kV, 0.1-100pA, He-ion beam), 3nm@30kV, 1pA (Ga-ion beam)
    • liquid nitrogen source cooling

    Location

    • P5/NBAA clean room