Dual-Beam System (FEI Helios Nanolab)
Specifications
- Electron Beam:
- Resolution: 0.9 nm (15 kV)
- Landing Voltage: 350 V - 30 kV
- Probe current: < 22 nA
- Maximum horizontal field width: 1.5 mm at beam coincident point
(WD 4 mm)
- Ion Beam:
- Resolution: 4 nm (30 kV)
- Landing Voltage: 500 V - 30 kV
- Probe current: 1.5 pA - 20 nA
- Maximum horizontal field width: 2.5 mm at 5 kV at beam coincidence point
- Gas injection for deposition of platinum, wolfram and SiO2
- Etch gas supply (XeF2)
- STEM detector
Location
- Microstructure laboratory
Pulications
Atomically flat single-crystalline gold nanostructures for plasmonic nanocircuitry
J.-S. Huang, V. Callegari, P. Geisler, C. Brüning, J. Kern, J.C. Prangsma, X. Wu, T. Feichtner, J. Ziegler, P. Weinmann, M. Kamp, A. Forchel, P. Biagioni, U. Sennhauser, and B. Hecht
Nature Communications 1, 150 (2010)
Mode Imaging and Selection in Strongly Coupled Nanoantennas
J.S. Huang, J. Kern, P. Geisler, P. Weinmann, M. Kamp, A. Forchel, P. Biagioni and B. Hecht
Nanoletters 10, 2105 (2010)
In-plane manipulation of quantum dots in high quality laterally contacted micropillar cavities
J. Beetz, C. Kistner, M. Lermer, C. Schneider, S. Reitzenstein, S. Höfling, M. Kamp, and A. Forchel
Appl. Phys. Lett. 98, 191111 (2011)
Fe3O4/ZnO: A high-quality magnetic oxide-semiconductor heterostructure by reactive deposition
M. Paul, D. Kufer, A. Müller, S. Brück, E. Goering, M. Kamp, J. Verbeeck, H. Tian, G. van Tendeloo, N.J.C. Ingle, M. Sing, and R. Claessen
App. Phys. Lett. 98, 012512 (2011)
